Comparison ledger
Agilent N 6700 B Low Profile Modular Power, Applied Materials 0010-03485 Magnet Assy, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | |
|---|---|---|
| OEM | Agilent | Applied Materials |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Agilent N 6700 B Low Profile Modular Power | Applied Materials 0010-03485 Magnet Assy |
| Specifications | ||
| Configuration | Includes:[1] | WP AL 300mm PVD[3] |
| Power | 400 W when operating from 100 - 240 VAC input[1] | — |
| AC Input | Nominal Input Ratings: 100 VAC - 240 VAC; 50/60/400 Hz[1] | — |
| Input Range | 86 VAC - 264 VAC[1] | — |
| Power Consumption | 1000 VA typical[1] | — |
| Fuse | Internal fuse (not customer accessible)[1] | — |
| Protection Response Characteristics | INH input: 5 μs from receipt of inhibit to start of shutdown[1] | — |
| Fault on coupled outputs | < 10 μs (from receipt of fault to start of shutdown)[1] | — |
| Type | Modular power system that accepts plug-in DC power supply modules[2] | — |
| Maximum total output power | 400 W when operating from 100 to 240 VAC input[1] | — |
| AC input nominal ratings | 100 VAC - 240 VAC; 50/60/400 Hz[1] | — |
| AC input range | 86 VAC - 264 VAC[1] | — |
| Protection response characteristics, INH input | 5 μs from receipt of inhibit to start of shutdown[1] | — |
| Protection response characteristics, fault on coupled outputs | < 10 μs from receipt of fault to start of shutdown[1] | — |
| Included modules | N 6732 B -7 units; N 6731 B -2 units; cabinet[1] | — |
| OEM | — | Applied Materials[3] |
| Model | — | 0010-03485[3] |
| Description | — | MAGNET ASSY, WP AL 300MM PVD[4] |
| Process | — | PVD[5] |
| Wafer size | — | 300mm[6] |
| Version | — | Spares[6] |
| Part Number | — | 0010-03485[3] |
| Manufacturer | — | Applied Materials[3] |
| Process Type | — | PVD (Physical Vapor Deposition)[3] |
| Application (Material) | — | Aluminum (AL)[3] |
| Wafer Diameter (associated) | — | 300 mm[3] |