Waferpedia

Comparison ledger

0010-03485 Magnet AssyversusLP-5J

Applied Materials 0010-03485 Magnet Assy, Brooks LP-5J, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
LP-5JBrooks
OEMApplied MaterialsBrooks
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
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FamilyApplied Materials 0010-03485 Magnet AssyBrooks LP-5J
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]—
Model0010-03485[1]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Series—LP Series[5]
Depth—1.2 in[5]
Form—12S[5]
Accommodation—RJ-11 telephone jack for direct access[5]
Intended use—Communication cable routing, monitor equipment, and service provider access[5]
Product type—Meter interbase adapter, LP Series[5]
Depth profile—Low Profile 1.2" Depth[5]
Meter form—12S[5]
Designed for—Communication cable routing, monitor equipment and service provider access[5]
Construction—One-piece injection molded polycarbonate shell with clear polycarbonate dead-front safety shield[5]
Accessory capability—Can accommodate an RJ-11 telephone jack for direct access[5]
Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]brooksutility.combrooksutility.com