Waferpedia

Comparison ledger

0010-03485 Magnet AssyversusBTZ-133 Temperature

Applied Materials 0010-03485 Magnet Assy, Espec BTZ-133 Temperature, side by side. Every value shown is drawn from the cited encyclopedia entries.

Email
Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
OEMApplied MaterialsEspec
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyEspec BTZ-133 Temperature
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]—
Model0010-03485[1]BTZ-133[5]
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]Espec[5]
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Temperature—Temperature Low -70°C[5]
Short description—Temperature chamber[5]
Condition—Used[5]
Year—2011[5]
Exterior dimensions (W x D x H)—30.25" x 33.5" x 34"[5]
Interior dimensions (W x D x H)—19.6" x 11" x 12"[5]
Workspace volume—1.5 cubic ft (42 L)[5]
Temperature low—-70°C[5]
Temperature high—180°C[5]
Input power—115 V[5]
Average change rate heating—3.5°C/min[5]
Average change rate cooling—3°C/min[5]
Heat-to-room peak—5,100 BTU/Hr[5]
Maximum sound level—65 dBA at 1 meter away[5]
Temperature fluctuation—±0.5C at control sensor[5]
Includes—Base cart with casters[5]
Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]dealer listingwotol.com