Comparison ledger
Applied Materials 0010-03485 Magnet Assy, ESPEC TSE 11 A, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | TSE 11 AESPEC |
|---|---|---|
| OEM | Applied Materials | ESPEC |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | ESPEC TSE 11 |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | This unit rolls[5] |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | TSE 11 A[5] |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Equipment type | — | Thermal shock chamber[6] |
| Vintage | — | 2004[5] |
| High temperature exposure range | — | +60 to +200°C (+140 to +392°F)[6] |
| Low temperature exposure range | — | -65 to 0°C (-85 to +32°F)[6] |
| Temperature fluctuation | — | ±0.5°C (±0.9°F)[6] |
| Pre-heat upper limit | — | +200°C (+392°F)[6] |
| Heat-up time | — | Ambient temperature to +200°C within 30 min.[6] |
| Pre-cool lower limit | — | -80°C (-112°F)[6] |
| Two-zone transition | — | Vertical transfer of specimen[6] |