Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Hitachi Z-5310, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | Z-5310Hitachi |
|---|---|---|
| OEM | Applied Materials | Hitachi |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Hitachi Z-5310 |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Insp | — | spectrophotometer/flame[5] |
| Optical system | — | Polarized Zeeman correction (DC magnetic field)[6] |
| Spectroscope | — | Czerny-Turner mount[6] |
| Burner | — | Premix type (titanium)[6] |
| Atomization | — | Flame method (standard)[6] |
| Wavelength range | — | 190 to 900 nm[6] |
| Light source | — | Hollow cathode lamp (multi-element lamp turret)[7] |
| Detector | — | High-sensitivity photomultiplier tube[7] |
| Flame composition | — | Air-acetylene flame, nitrous oxide-acetylene flame (requires switching)[7] |
| Photometry | — | Double-beam (D2 background correction), single-beam (Zeeman)[7] |