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0010-03485 Magnet AssyversusFLX 2320 A Thin Film Stress Measurement

Applied Materials 0010-03485 Magnet Assy, KLA FLX 2320 A Thin Film Stress Measurement, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
OEMApplied MaterialsKLA
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—1993 Year introduced
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyKLA FLX 2320
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]—
Model0010-03485[1]FLX 2320 A[5]
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]KLA[5]
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Phase—1 Phase[5]
Frequency—60 Hz[5]
Electrical supply—1 Phase, 60 Hz[5]
Year introduced—1993[6]
Voltage—115 V[6]
Equipment type—Thin Film Stress Measurement[5]
Power—1 Phase, 60 Hz[6]
Vintage—1993 Vintage[5]
Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]inventory listing
  6. [6]waferpedia.comwaferpedia.com