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0010-03485 Magnet AssyversusV 300

Applied Materials 0010-03485 Magnet Assy, Rigaku V 300, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
V 300Rigaku
OEMApplied MaterialsRigaku
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyRigaku V 300
Cited variants—
Specifications
ConfigurationWP AL 300mm PVD[2]VPD configuration[1]
OEMApplied Materials[2]—
Model0010-03485[2]V 300[6]
DescriptionMAGNET ASSY, WP AL 300MM PVD[3]—
ProcessPVD[4]—
Wafer size300mm[5]12-inch[1]
VersionSpares[5]—
Part Number0010-03485[2]—
ManufacturerApplied Materials[2]Rigaku[6]
Process TypePVD (Physical Vapor Deposition)[2]—
Application (Material)Aluminum (AL)[2]—
Wafer Diameter (associated)300 mm[2]—
Equipment type—semiconductor manufacturing equipment[7]
Sources (7)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]inventory listing
  3. [3]semistarcorp.comsemistarcorp.com
  4. [4]layla-ec.comlayla-ec.com
  5. [5]fabsurplus.comfabsurplus.com
  6. [6]Equipment inventory listing
  7. [7]waferpedia.comwaferpedia.com