Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Tokyo Electron Act 8 Coater Developer Track, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | Act 8 Coater Developer TrackTokyo Electron |
|---|---|---|
| OEM | Applied Materials | Tokyo Electron |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | 1997– |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Tokyo Electron Act |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | Coater and developer track in-line with the ASML PAS5500/350C stepper[7] |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | Act 8[5] |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | 6 inch[5] |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | Tokyo Electron[5] |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Loading | — | Cassette to Cassette[5] |
| Equipment type | — | Coater / Developer Track[5] |
| Purpose | — | Photoresist spin-coater and developer[6] |
| Configured wafer size | — | 100 mm (4")[7] |
| Optional wafer size conversion | — | 150 mm (6")[7] |
| Process type | — | DUV lithography using KrF photoresist and ancillary anti-reflective coatings[7] |
| Production debut year | — | 1997[8] |
| Original wafer size | — | 200mm wafers[8] |