Comparison ledger
Applied Materials 0010-13622 RF Match for, Hitachi Kokusai DJ 1223 V, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | Kokusai DJ 1223 VHitachi |
|---|---|---|
| OEM | Applied Materials | Hitachi |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Hitachi Kokusai |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | Nitride[2] |
| Model | 0010-13622[1] | DJ 1223 V[2] |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Maker | — | Hitachi Kokusai[2] |
| Equipment type | — | CVD (Chemical Vapor Deposition)[2] |
| Process | — | Nitride[2] |
| Operating mode | — | Low Pressure[2] |
| Vintage | — | 2001[2] |
| Wafer size | — | 300mm[3] |
| Controller | — | CX3010[3] |
| Power | — | 3P 208V[3] |
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