Comparison ledger
Applied Materials 0010-13622 RF Match for, Lam Research Vector Express, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | Vector ExpressLam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | 2007– |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Lam Research Vector Express |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | — |
| Model | 0010-13622[1] | Vector Express[2] |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Manufacturer | — | Lam[2] |
| Category | — | Deposition[3] |
| Wafer size | — | 12 inch[2] |
| System type | — | PECVD (Plasma-Enhanced Chemical Vapor Deposition)[3] |
| Platform size | — | 300 mm VECTOR platform[4] |
| Process throughput improvement | — | up to 40%[4] |
| OEM | — | Lam Research[2] |
| Process type | — | Chemical Vapor Deposition (CVD), plasma-enhanced chemical vapor deposition (PECVD)[2] |
| Platform | — | VECTOR platform[4] |
| Throughput improvement | — | up to 40%[4] |
| Process node extendibility | — | 45nm node and beyond[4] |
| Process feature | — | SmartSoak processing feature[4] |
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