Comparison ledger
Applied Materials 0010-13622 RF Match for, Temescal TES 44, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | TES 44Temescal |
|---|---|---|
| OEM | Applied Materials | Temescal |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Temescal TES 44 |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | Fast cycle load locked, sputter down[2] |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Substrate table | — | Water cooled, RF bias, rotating[2] |
| Film uniformity | — | +/- 5% typical[2] |
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