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Comparison ledger

0010-13627 High Efficiency RF MatchversusIXH 610

Applied Materials 0010-13627 High Efficiency RF Match, Edwards IXH 610, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
IXH 610Edwards
OEMApplied MaterialsEdwards
CategoryLab & Support EquipmentLab & Support Equipment
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13627 High Efficiency RF MatchEdwards IXH
Specifications
ConfigurationHE, BIAS[1]Fully refurbished[3]
Asset Number70430[2]—
TypeHigh Efficiency RF Match - HE, BIAS[2]dry vacuum pump[4]
OEMApplied Materials[2]—
Model0010-13627[2]—
Application—harsh chemical applications[4]
Input power—1.3 kW[4]
Peak pumping speed—665 m3/h (391 CFM)[4]
Ultimate pressure—3.7 x 10-3 Torr[4]
Inlet connection—ISO100[5]
Exhaust connection—KF40[5]
Weight—782 lbs[5]
System power at ultimate—2.6 kW[6]
Typical water flow—3 l/m[6]
Purge flow range—22/44 slm[6]
Dry pump size—100 m3/h[6]
Booster size—600 m3/h[6]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]Equipment inventory listing
  3. [3]inventory listing
  4. [4]idealvac.comidealvac.com
  5. [5]provac.comprovac.com
  6. [6]ptbsales.comptbsales.com