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0010-13627 High Efficiency RF MatchversusAlcatel Drytel 31 Vacuum

Applied Materials 0010-13627 High Efficiency RF Match, Pfeiffer Alcatel Drytel 31 Vacuum, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
OEMApplied MaterialsPfeiffer
CategoryLab & Support EquipmentLab & Support Equipment
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13627 High Efficiency RF MatchPfeiffer Alcatel
Specifications
ConfigurationHE, BIAS[1]Working but needs to be rebuilt (kit provided)[3]
Asset Number70430[2]—
TypeHigh Efficiency RF Match - HE, BIAS[2]—
OEMApplied Materials[2]—
Model0010-13627[2]—
Pump type—Oil-free turbo drag high vacuum pumping system[4]
Pump configuration—Turbo drag pump backed by diaphragm pump[5]
Inlet flange—DN 63 ISO-K[5]
Exhaust flange—DN 16 ISO-KF[6]
Pumping speed—7.5 l/s[5]
Ultimate pressure—1 x 10^-6 Torr[5]
Operating voltage—115 VAC / 60 Hz[5]
Air cooling—Fully air cooled with an internal cooling fan[5]
Operating range—From atmosphere to 5x10-6 mbar[5]
Maximum chamber size—Up to 50 liters[7]
Maximum pumping speed in high vacuum range—16 cfm[7]
Primary turbo drag pump—MDP-5011[5]
Primary turbo drag pump inlet flange—DN-63-ISO[5]
Rotation speed—27,000 rpm[7]
Backing pump—1 m^3/hr diaphragm pump[7]
Maximum flow rate—400 sccm[6]

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Sources (7)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]Equipment inventory listing
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com
  5. [5]ajvs.comajvs.com
  6. [6]ptbsales.comptbsales.com
  7. [7]webshop.hositrad.comwebshop.hositrad.com