Waferpedia

Comparison ledger

0010-13627 High Efficiency RF MatchversusC 355 Chiller

Applied Materials 0010-13627 High Efficiency RF Match, Tokyo Electron C 355 Chiller, side by side. Every value shown is drawn from the cited encyclopedia entries.

Email
Side-by-side comparison of selected equipment models
Attribute
C 355 ChillerTokyo Electron
OEMApplied MaterialsTokyo Electron
CategoryLab & Support EquipmentLab & Support Equipment
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13627 High Efficiency RF MatchTokyo Electron C 355 Chiller
Specifications
ConfigurationHE, BIAS[1]Unit has damage[3]
Asset Number70430[2]—
TypeHigh Efficiency RF Match - HE, BIAS[2]—
OEMApplied Materials[2]—
Model0010-13627[2]—
Vintage—2008[3]

Plan your fab

Building a Lab & Support Equipment process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]Equipment inventory listing
  3. [3]inventory listing