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Comparison ledger

0010-16392 ESC AssemblyversusRF 350

Applied Materials 0010-16392 ESC Assembly, Veeco RF 350, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-16392 ESC AssemblyApplied Materials
RF 350Veeco
OEMApplied MaterialsVeeco
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-16392 ESC AssemblyVeeco RF 350
Specifications
OEMApplied Materials[1]—
Model0010-16392[1]—
TypeESC Assembly[1]—
Wafer Size300 mm[2]—
Electrode ConfigurationDual[2]—
Configuration—Missing Parts[3]
Category—Etch[4]
Tool type—Ion Beam Etcher (IBE)[4]
Process modes—Ion Beam Etching (IBE) and Reactive Ion Beam Etching (RIBE)[4]
Ion source type—inductively coupled, filamentless RF ion source[4]
Ion source diameter—300 mm[4]
Substrate loading—single-substrate loadlocked (or configurable to cassette-to-cassette)[4]
Wafer size—single 6" (150 mm)[4]
Loading—single 6" wafer loading[4]
Applications—MEMS, semiconductor fabrication, and data storage[4]
Missing parts—Missing parts[3]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]spwindustrial.comspwindustrial.com
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com