Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Hitachi IML 6 1 Ion Mill, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | IML 6 1 Ion MillHitachi |
|---|---|---|
| OEM | Applied Materials | Hitachi |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Hitachi IML 6 1 Ion Mill |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | IML 6 1[3] |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Configuration | — | With:[3] |
| OEM | — | Hitachi[3] |
| Equipment type | — | Ion mill[3] |
| Wafer size | — | 6 inch[3] |
| Power | — | DC Volt Generator[4] |
| Vacuum & pumping | — | Kashyama CH 60 Dry Pump[4] |
| Configuration & options | — | CH-4014 Circulator; Spare Parts[4] |
| Vintage | — | 1997[3] |