Waferpedia

Comparison ledger

0010-22161 High EFF RF MatchversusE-300

Applied Materials 0010-22161 High EFF RF Match, Olympus E-300, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
E-300Olympus
OEMApplied MaterialsOlympus
Category——
Wafer size——
Process node——
Introduced——
Production run—2005–
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-22161 High EFF RF MatchOlympus E-300
Specifications
MakeApplied Materials[1]—
Model0010-22161[1]—
DescriptionHTESC PH 1 REV A[2]—
ConditionUsed[2]—
Stock NumberBM6628[2]—
Sensor size—4/3-inch (17.3 x 13mm)[3]
Image stabilization—In-body, effective up to 4 stops[3]
Lens mount—Four Thirds system, with 2x crop factor[3]
Sources (3)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]tarasemi.comtarasemi.com
  3. [3]grokipedia.comgrokipedia.com