Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Onto Innovation Nanospec 9300 Film Analysis, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | Nanospec 9300 Film AnalysisOnto Innovation |
|---|---|---|
| OEM | Applied Materials | Onto Innovation |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Onto Innovation Nanospec 9300 Film Analysis |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | Nanospec 9300[3] |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Manufacturer | — | Onto Innovation / Nanometrics[3] |
| Tool type | — | Film Analysis System[4] |
| Measurement application | — | Thin film thickness measurement[5] |
| Instrument type | — | Spectroscopic Reflectometer (SR)[5] |
| Configured wafer size | — | 12"[5] |
| Alternate wafer handling | — | Can be modified for 8" open cassette handling[5] |
| Visible light source | — | Tungsten halogen lamp[5] |
| UV light source | — | Deuterium arc lamp[5] |
| Lens | — | 4x, 15x (Visible & UV)[5] |
| System computer and monitor | — | Computer & LCD monitor[5] |
| Metrology software | — | Windows XP-based N2000 metrology software (Version N2000 4.2.90 Beta)[5] |
| Head type | — | UV DIO[5] |
| Video camera | — | RS170 (B/W)[5] |
| Wafer handling | — | Kensington Robot & Stage Asyst FOUP 300mm[5] |
| Input power | — | 208 VAC, 18 A, 50/60 Hz[5] |
| Optics | — | 4x, 15x (Visible & UV)[3] |
| Vintage year | — | 2002[5] |