Waferpedia

Comparison ledger

0020 17484 PartversusSEC-600

Applied Materials 0020 17484 Part, CHA SEC-600, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
0020 17484 PartApplied Materials
OEMApplied MaterialsCHA
CategoryDepositionDeposition
Wafer size—6 in.
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17484 PartCHA SEC-600
Specifications
ConfigurationBar, Cap Bank, Hdpcvd 300mm Ultima X[1]—
System type—Sputtering System[2]
Wafer size—6 in.[2]
Equipment description—E-beam evaporator[4]
Approved deposition materials—Al, Au, Ag, Cu, Cr, Ge, Ni, Mo, Pd, Pt, Ti, and others on a case-by-case basis[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]web.archive.orgweb.archive.org
  3. [3]chaindustries.comchaindustries.com
  4. [4]hmntl.illinois.eduhmntl.illinois.edu