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Comparison ledger

0020 17484 PartversusTytan 1600 LPCVD

Applied Materials 0020 17484 Part, Tystar Tytan 1600 LPCVD, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
0020 17484 PartApplied Materials
OEMApplied MaterialsTystar
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17484 PartTystar Tytan 1600 LPCVD
Cited variants—
  • Tytan 1600 LPCVD Carbon Nanotube Growth[1]
  • Mini Tytan 1600 Horizontal Furnace, 1 Stack, 150 mm, LPCVD[2]
Specifications
ConfigurationBar, Cap Bank, Hdpcvd 300mm Ultima X[3]with:[4]
Process Temperature—up to 900° Celsius[1]
Low Pressure Range—50 Torr to 700 Torr[1]
Number of Gas Lines—5[1]
Electrical Configuration—208VAC, 60Hz, 3 Phase, 5-Wire[1]
Substrate Capacity (carbon nanotube variant)—up to 32 sheets of 200mm x 200mm substrates[1]
Furnace Configuration—Horizontal furnace[2]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]semistarcorp.comsemistarcorp.com
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]inventory listing
  4. [4]inventory listing