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Comparison ledger

0020 17485 PartversusMark 50 LH Vacuum

Applied Materials 0020 17485 Part, CHA Mark 50 LH Vacuum, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 17485 PartApplied Materials
OEMApplied MaterialsCHA
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17485 PartCHA Mark 50 LH Vacuum
Specifications
ConfigurationStrap, RF Out 2 Balanced Coil Match, Hdp[1]—
Phase—3 Phase, 208 VAC, 50/60 Hz / 150 A[2]
Water—9.25 GPM[2]
Air—90-100 Psi[2]
Dry Pump—Edward IH 80[2]
Compressor #1—CT 9600[2]
Compressor #2—CTI 960[2]
Power Supply—CHA SR 10 D 212[2]
PN—8116240 G 002[2]
Make—CHA[2]
Model—Mark 50 LH[2]
Wafer Sizes—6 inch[2]
Power—3 Phase, 208 VAC, 50/60 Hz, 150 A[2]
Water requirement—9.25 GPM[2]
Air requirement—90-100 Psi[2]
On-Board Cryo Pump—400 Cryo Pump (PN: 8116240 G 002)[2]
On-Board Waterpump—PN: 8116135 G 001R[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing