Waferpedia

Comparison ledger

0020 17485 PartversusAtlus Max

Applied Materials 0020 17485 Part, Lam Research Atlus Max, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 17485 PartApplied Materials
Atlus MaxLam Research
OEMApplied MaterialsLam Research
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17485 PartLam Research Atlus Max
Specifications
ConfigurationStrap, RF Out 2 Balanced Coil Match, Hdp[1]—
Make—Lam[2]
Model—Atlus Max[2]
Process—Chemical Vapor Deposition (CVD)[2]
Asset number—83400[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]Equipment inventory listing