Waferpedia

Comparison ledger

0020 18455 PartversusTrias

Applied Materials 0020 18455 Part, Tokyo Electron Trias, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 18455 PartApplied Materials
TriasTokyo Electron
OEMApplied MaterialsTokyo Electron
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 18455 PartTokyo Electron Trias
Specifications
ConfigurationShaft,Rf In Local Match, Hdpcvd,Rev3[1]—
Process Type—Chemical Vapor Deposition (CVD)[2]
Type—CVD (Chemical Vapor Deposition)[2]

Plan your fab

Building a Deposition process? Get a complete equipment list.

Open the fab equipment planner →
Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]Equipment inventory listing