Waferpedia

Comparison ledger

0020 18698 PartversusConcept Two Sequel Express

Applied Materials 0020 18698 Part, Lam Research Concept Two Sequel Express, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 18698 PartApplied Materials
OEMApplied MaterialsLam Research
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 18698 PartLam Research Concept Two
Specifications
ConfigurationDial Cover, Side Local Match, Hdpcvd, Ul[1]50/60 Hz[2]
Phase—3 Phase[2]
Voltage—208 Vac[3]
Type—Deposition chamber[2]
Power—3 Phase[3]
Frequency—50/60 Hz[3]
Included system—Kanken Abatement System[2]

Plan your fab

Building a Deposition process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com