Waferpedia

Comparison ledger

0020 23839 PartversusIBD

Applied Materials 0020 23839 Part, Oxford Instruments IBD, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 23839 PartApplied Materials
IBDOxford Instruments
OEMApplied MaterialsOxford Instruments
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 23839 PartOxford Instruments IBD
Cited variants—
  • Oxford IBD Chamber (Ion Beam Deposition) with hollow cathode DC ion source[1]
  • Oxford IBD Chamber (Ion Beam Deposition) with RF gridded ion source[2]
Specifications
ConfigurationPlate, Sensor Clamp, Hdpcvd Ultima +[3]with hollow cathode DC ion source[1]
Technology—Ion Beam Deposition[1]
Ion Source (configurable)—Hollow cathode DC ion source or RF gridded ion source[1]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]inventory listing