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Centura TPCC RTP XE+ RTPversus0332 F 9453 302 Diffusion

Applied Materials Centura TPCC RTP XE+ RTP, Varian 0332 F 9453 302 Diffusion, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
Centura TPCC RTP XE+ RTPApplied Materials
OEMApplied MaterialsVarian
CategoryThermal / DiffusionThermal / Diffusion
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials Centura TPCCVarian 0332 F 9453 302 Diffusion
Specifications
Phase3 Phase[1]—
Configuration4 Wire[1]—
Voltage208 Vac[1]—
OEMApplied Materials[1]—
ModelCentura TPCC RTP XE+[1]0332 F 9453 302[2]
System typeRapid Thermal Process[1]—
Wafer size8 inch[1]—
Power3 Phase - 4 Wire - 208 Vac - 50/60 Hz[1]—
Vintage2000[1]—
Asset Number—142841[2]
Last Confirm Date—October 14, 2025[3]
Make—Varian[2]
Category—Thermal / Diffusion[4]
Tool type—diffusion pump[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]Equipment inventory listing
  3. [3]fab-spares.comfab-spares.com
  4. [4]waferpedia.comwaferpedia.com