Comparison ledger
ASML PAS 5000 55 A, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | PAS 5000 55 AASML | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | ASML | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | Wafer Tilt Monitor | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML PAS 5000 55 A | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Software Version | 8.1.0[1] | — |
| Configuration | Includes Option File:[1] | — |
| Wafer size | Wafer Tilt Monitor[2] | — |
| Manufacturer | ASML[1] | — |
| Model | PAS 5000 / 55 A[1] | — |
| Equipment type | Stepper[2] | — |
| Category | Lithography[2] | — |
| Includes Option File | PEP 2 (Color Graphics); PEP 1/3/4; Extended Filesystem (MEP); Reticle Error Correction; Throughput Enhancement; Batch Status Light; 88 um Error Detection; Chuckspot Detection; Wafer Tilt Monitor[1] | — |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →