Waferpedia

Comparison ledger

NV GSD 200 High Currentversus0216 7696, E 11368072 ESC

Axcelis NV GSD 200 High Current, Varian 0216 7696, E 11368072 ESC, side by side. Every value shown is drawn from the cited encyclopedia entries.

Email
Side-by-side comparison of selected equipment models
Attribute
OEMAxcelisVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis NV GSD 200Varian 0216 7696, E 11368072 ESC
Specifications
ConfigurationDeploys Ar, AsH3, BF3 and PH3[1]Platen ADV-S Type[3]
ManufacturerAxcelis[1]—
ModelNV GSD 200[1]—
CategoryIon Implantation[2]Ion Implantation[4]
Tool typeHigh current ion implanter[2]—
Wafer size6 inch[1]—
Process gasesAr, AsH3, BF3 and PH3[1]—
Type—ESC Platen ADV-S Type[3]

Plan your fab

Building a Ion Implantation process? Get a complete equipment list.

Open the fab equipment planner →
Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com