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Comparison ledger

NV GSD 200 High Currentversus160 XP Ion

Axcelis NV GSD 200 High Current, Varian 160 XP Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
OEMAxcelisVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis NV GSD 200Varian 160 XP Ion
Specifications
ConfigurationDeploys Ar, AsH3, BF3 and PH3[1]150mm High Current IMP[3]
ManufacturerAxcelis[1]—
ModelNV GSD 200[1]160 XP Ion[4]
CategoryIon Implantation[2]Ion Implantation[3]
Tool typeHigh current ion implanter[2]ion implanter[3]
Wafer size6 inch[1]—
Process gasesAr, AsH3, BF3 and PH3[1]—
OEM—Varian[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]waferpedia.comwaferpedia.com
  4. [4]Equipment inventory listing