Waferpedia

Comparison ledger

FPA 5500 iZ+ i-Lineversus1505 G 6 E

Canon FPA 5500 iZ+ i-Line, Nikon 1505 G 6 E, side by side. Every value shown is drawn from the cited encyclopedia entries.

Email
Side-by-side comparison of selected equipment models
Attribute
OEMCanonNikon
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run—1988–
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCanon FPA 5500Nikon 1505
Cited variants
  • FPA 5500 iZ+ i-Line Stepperi-line[1]
  • FPA 5500 iZi-line[2]
  • FPA 5500 iZ i-Line[2]
—
Specifications
Configuration350nm[2]5" reticle[5]
MakeCanon[3]Nikon[5]
ModelFPA 5500 iZ+[3]1505 G 6 E[5]
TypeStepper[3]—
i-LineYes[3]—
Wafer Sizes12 inch[4]4 inch[5]
Vintage2004[3]—
Resolution—650 nm[6]
Numerical Aperture—0.54[6]
Reduction—5x[6]
Exposure Field—15 x 15 mm[6]
Alignment Accuracy—130 nm[6]
Wafer Size—4 inch[5]
Light Source—g-line[7]
Introduction Year—1988[6]
NA (Numerical Aperture)—0.54[6]
Category—Stepper[5]
Exposure type—g-line[6]
NA—0.54[6]
Exposure field—9.3 x 18.8 mm[6]

Plan your fab

Building a Lithography process? Get a complete equipment list.

Open the fab equipment planner →
Sources (7)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]waferpedia.comwaferpedia.com
  4. [4]Equipment inventory listing
  5. [5]inventory listing
  6. [6]web.archive.orgweb.archive.org
  7. [7]ece.utoronto.caece.utoronto.ca