Waferpedia

Comparison ledger

120 Automated Coater ProcessingversusRF 300 A Photo Track

EV Group 120 Automated Coater Processing, SCREEN RF 300 A Photo Track, side by side. Every value shown is drawn from the cited encyclopedia entries.

Email
Side-by-side comparison of selected equipment models
Attribute
OEMEV GroupSCREEN
CategoryResist ProcessingResist Processing
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyEV Group 120 Automated Coater ProcessingSCREEN RF 300 A Photo Track
Specifications
Configuration50/60 Hz[1]Modifications:[2]
Phase3 Phase[1]—
Wafer sizes6 inch, 8 inch[1]—
Frequency50/60 Hz[1]—
Wiring configuration4 Wire + GND[1]—
Vintage2015[1]—
Robot Change—IHU, MHU (2), BHU[2]
Bake—CP (6), FRHP (7)[2]
Make—SCREEN / DNS[2]
Model—RF 300 A[2]
Modifications—Robot Change: IHU, MHU (2), BHU; Bake: CP (6), FRHP (7); Loadport (10); Cleanbooth; SC Cup Parts (2) (change and retrofit); SD Cup Parts, Nozzle (2) (change and retrofit); 10 L Nowpack Cabinet; ETU-Cab; Resist 8 High Viscosity (140 cp); Low Height Mod (Top Module Separation); BARC/Resist Separation Drain; Facility Connection Parts (change and retrofit); Power BOX Mod Parts (change and retrofit); Fire Suppression[2]
Resist 8 High Viscosity—140 cp[3]

Plan your fab

Building a Resist Processing process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com