Comparison ledger
Headway 1 EC 101 R 485 Photoresist Spinner, Laurell H6-15 B, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | H6-15 BLaurell | |
|---|---|---|
| OEM | Headway | Laurell |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | 300mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Headway 1 EC 101 R 485 Photoresist Spinner | Laurell H6-15 B |
| Specifications | ||
| Vacuum requirement | 23" Hg[1] | — |
| Electrical | 115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[1] | — |
| Model | — | H6-15 B[2] |
| Type | — | Spin Coater[2] |
| Controller | — | 650-series[2] |
| Max. Substrate Size | — | 300mm (9" x 9")[2] |
| Max. RPM | — | 12000 rpm[2] |
| Mounting Options | — | Tabletop, In-Deck, On-deck[2] |
Plan your fab
Building a Resist Processing process? Get a complete equipment list.
Open the fab equipment planner →