Comparison ledger
Headway 1 EC 101 R 485 Photoresist Spinner, Laurell WS-650-15 B, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | WS-650-15 BLaurell | |
|---|---|---|
| OEM | Headway | Laurell |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | 300mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Headway 1 EC 101 R 485 Photoresist Spinner | Laurell WS-650-15 B |
| Specifications | ||
| Vacuum requirement | 23" Hg[1] | — |
| Electrical | 115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[1] | — |
| Type | — | Spin Coater[2] |
| Controller | — | 650-series[2] |
| Max Substrate Size | — | ø 300mm (9" × 9")[2] |
| Max RPM | — | 12000 rpm[2] |
| Mounting Options | — | Tabletop, In-Deck, On-Deck[2] |
| OEM | — | Laurell[3] |
| Model | — | WS-650-15 B[3] |
| Series | — | 650-series[3] |
| Max substrate size | — | ø 300mm wafers and 9" × 9" (229mm × 229mm) substrates[3] |
| Category | — | Spin Coater[2] |
| Processes supported | — | Coating, Etching, Developing, Rinsing-Drying and Cleaning[3] |
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