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Comparison ledger

1 EC 101 R 485 Photoresist SpinnerversusGamma Spray

Headway 1 EC 101 R 485 Photoresist Spinner, SUSS MicroTec Gamma Spray, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
Gamma SpraySUSS MicroTec
OEMHeadwaySUSS MicroTec
CategoryResist ProcessingResist Processing
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyHeadway 1 EC 101 R 485 Photoresist SpinnerSUSS MicroTec GAMMA
Specifications
Vacuum requirement23" Hg[1]—
Electrical115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[1]—
Electrical power115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[1]—
Configuration—Spray coater modules (2)[2]
Equipment type—Spray coater[3]
Make—SUSS[3]
Model—Gamma[3]
Listed contents—Spray coater modules (2), developer (1), power supply, auxiliary parts[2]
Family—Gamma family[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com