Comparison ledger
KLA 1.112 PSL Wafer, KLA RS 75 Resistivity Mapper, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ||
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 1.112 PSL Wafer | KLA RS 75 |
| Specifications | ||
| Configuration | NIST Traceable[1] | 220 Volts[3] |
| Wafer Size | 8 inch[1] | — |
| NIST Traceable | True[1] | — |
| Compatible Tools | Surfscan 6xy0 and Sp1[2] | — |
| Voltage | — | 120 V[4] |
| Manufacturer | — | KLA[3] |
| Model | — | RS 75[3] |
| Equipment type | — | Resistivity Mapper[3] |
| Wafer size | — | 8 inch[3] |
| Electrical rating | — | 220 V, 1.8 kW, 50/60 Hz[3] |
| Vintage | — | 1996[3] |
| Measurement range | — | 5 mΩ/sq to 5 MΩ/sq[6] |
| Repeatability (VLSI) | — | < 0.2% (1σ)[6] |
| Accuracy (VLSI) | — | ±1%[6] |
| Edge exclusion | — | 3 mm from edge of film[6] |
| Throughput (5-site) | — | 100 WPH[6] |
| Alignment system | — | Notch/Flat aligner on Probe Arm[6] |
| Computer OS | — | DOS[6] |
| Software | — | Rev 6.22[6] |
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