Comparison ledger
KLA 1.112 PSL Wafer, Nikon LV100ND, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | LV100NDNikon | |
|---|---|---|
| OEM | KLA | Nikon |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 1.112 PSL Wafer | Nikon LV100ND |
| Cited variants | — | |
| Specifications | ||
| Configuration | NIST Traceable[3] | — |
| Wafer Size | 8 inch[3] | — |
| NIST Traceable | True[3] | — |
| Compatible Tools | Surfscan 6xy0 and Sp1[4] | — |
| Microscope type | — | Optical microscope[5] |
| Lighting | — | Top and bottom lighting using LED white light with adjustable intensity[5] |
| Objectives | — | 5X, 10X, 20X, 50X, and 100X Plan Fluor high numerical aperture lenses[5] |
| Brightfield / darkfield | — | 10X Ultra Wide Field brightfield and darkfield for all five lenses[5] |
| DIC | — | Selectable Nomarski Differential Interference Contrast for top-down lighting only[5] |
| Stage | — | 6" x 4" XY stage with glass plate[5] |
| Condenser | — | Abbe condenser[5] |
| Camera | — | DS-Ri2 Nikon camera, high definition 18 megapixel[5] |
| Software | — | Nikon NIS-Elements D Software[5] |
| Instrument count and locations | — | Two microscopes in the Flexible Cleanroom and two in the Nanopatterning Cleanroom[5] |
| Eyepiece | — | 10X Ultra Wide Field[5] |
| Illumination | — | Top and bottom lighting using LED white light with adjustable intensity[5] |
| Optical system | — | CFI60 infinity[6] |
| Focusing | — | Coaxial coarse/fine focus knob; focus stroke 30 mm; coarse 14 mm per rotation; fine 0.1 mm per rotation; minimum reading in 1 μm increments[6] |
| Tube | — | P-TT3 trinocular tube for polarizing microscopy with eyepiece rotation prevention protrusions on the right side[6] |
| Power consumption | — | 1.2 A/75 W[6] |
| Contrast techniques | — | Episcopic and diascopic optical contrast techniques[1] |
| Application | — | Material inspection in many industrial applications[1] |
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