Comparison ledger
KLA 1.112 PSL Wafer, Olympus OLS 5100 SAF, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | OLS 5100 SAFOlympus | |
|---|---|---|
| OEM | KLA | Olympus |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 1.112 PSL Wafer | Olympus OLS |
| Specifications | ||
| Configuration | NIST Traceable[1] | High magnification[3] |
| Wafer Size | 8 inch[1] | — |
| NIST Traceable | True[1] | — |
| Compatible Tools | Surfscan 6xy0 and Sp1[2] | — |
| Equipment type | — | microscope system[4] |
| Magnification | — | high magnification[3] |
| Imaging | — | differential interference contrast (DIC)[3] |
| Stage | — | motorized stage[3] |
| Desk | — | anti-vibration desk[3] |
| Included | — | computer and software[3] |
| Category | — | Metrology & Inspection[4] |
| High magnification | — | included[3] |
| Differential interference contrast (DIC) | — | included[3] |
| Laser scanning microscopy (LSM) | — | included[3] |
| Motorized stage | — | included[3] |
| Anti-vibration desk | — | included[3] |
| Computer and software | — | included[3] |
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