Comparison ledger
KLA 2135 and KLA Prometrix UV 1250 SE Film Thickness Measurement, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | 2135KLA | |
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 2135 | KLA UV 1250 SE |
| Specifications | ||
| Product type | wafer inspection system[1] | — |
| Technology | advanced sensor and image processing technologies[1] | — |
| Inspection method | brightfield, small-pixel, high data rate, digital image processing technology[1] | — |
| Defect detection | detects all types of yield-relevant defects on all process layers[1] | — |
| Operational use | in-line monitoring of advanced processes[1] | — |
| Throughput | two- to three-times throughput improvement over the earlier model KLA 2132[1] | — |
| Phase | — | 1 Phase[2] |
| Configuration | — | 120 Volt[2] |
| Software Version | — | 2.4[2] |
| Robot Type | — | KLA H2D[2] |
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