Comparison ledger
KLA .498 PSL Wafer, Nikon Eclipse L 200 D, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Eclipse L 200 DNikon | |
|---|---|---|
| OEM | KLA | Nikon |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .498 PSL Wafer | Nikon Eclipse L 200 D |
| Specifications | ||
| Configuration | NIST Traceable[1] | — |
| NIST traceability | Yes[1] | — |
| OEM | KLA[1] | — |
| Category | Metrology & Inspection[1] | Metrology & Inspection[2] |
| Traceability | Yes[1] | — |
| Description | Particle-sizing calibration standard[1] | — |
| Power | — | 100–240 VAC[2] |
| Current | — | 2.4 A[2] |
| Frequency | — | 50/60 Hz[2] |
| Make | — | Nikon[3] |
| Model | — | Eclipse L 200 D[3] |
| Equipment type | — | Inspection Microscope[3] |
| Wafer size | — | 8 inch[3] |
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