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Comparison ledger

.498 PSL WaferversusOptistation 3200 Wafer

KLA .498 PSL Wafer, Nikon Optistation 3200 Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMKLANikon
CategoryMetrology & InspectionMetrology & Inspection
Wafer size—Wafer Hander:
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyKLA .498 PSL WaferNikon Optistation
Specifications
ConfigurationNIST Traceable[1]Pre-aligner[2]
NIST traceabilityYes[1]—
Wafer size—Wafer Hander:[2]
Loadport—2 sets of 300mm (12inch) FOUP type[2]
Stage movement range—0 to 300mm[2]
Objective—5X, 10X, 20X, 50X, 100X, 150X[2]
Eyepiece—10X[2]
Observation light—bright field, dark field[2]
Voltage—200 V±10%, 50/60 Hz[2]
Phase—3 kVA, 1 phase 3 wire[2]
Vacuum—-55~-75 kPa or greater[2]
Temperature—20-25*C[2]
Relative Humidity—40-60%[2]
Clearance—front:600, back:700, left:700, right:700[2]
Make—Nikon[2]
Model—Optistation 3200 Wafer[2]
Category—Metrology & Inspection[3]
Load port—2 sets of 300mm (12inch) FOUP type[2]
Power—200 V±10%, 50/60 Hz; 3 kVA; 1 phase 3 wire[2]
Flow—30 NL/min, 1/4'' tube[2]
Total magnification—25x to 1,500x[4]
Inspection modes—Brightfield, Darkfield, DIC (option), DUV (option)[4]
Autofocus—LED illumination slit projection[4]
Objectives—CFI60 objectives[4]
Macro inspection—Surface Macro, center backside Macro, perimeter backside Macro[4]
Wafer transfer—Robotic handling; vacuum chuck; noncontact pre-alignment mechanism[4]
Operation—Touch panel GUI, mouse, keyboard[4]
Options—DUV microscope; Hg-Xe lamp type (248nm)[4]
Online operation—Via SECS-I or HSMS[4]
Safety—S2-0302 compliance, CE marking compliance[4]
Ergonomic—S8-0701 compliance[4]
Dimensions—1,625 x 2,500 x 2,300mm (Rear load port)[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com
  4. [4]nikonusa.comnikonusa.com