Waferpedia

Comparison ledger

.498 PSL WaferversusVanox

KLA .498 PSL Wafer, Olympus Vanox, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
VanoxOlympus
OEMKLAOlympus
CategoryMetrology & InspectionMetrology & Inspection
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyKLA .498 PSL WaferOlympus Vanox
Specifications
ConfigurationNIST Traceable[1]—
NIST traceabilityYes[1]—
Platform type—Universal research microscope[2]
System design—Modular building-block system of interchangeable accessories[2]
Observation tube—Binocular tube with photo tube[2]
Observation tube inclination—30°[3]
Interpupillary distance adjustment range—56 mm to 75 mm[3]
Diopter adjustment range—-8 to +2 diop.[3]
Revolving nosepiece—Five-objective opening nosepiece; sextuple nosepiece optionally available[4]
Stage—170 mm x 172 mm stage with 300° rotation and 76 mm x 52 mm cross travel[4]
Standard condenser—NA 1.40 achromat/aplanatic condenser[4]
Light source—12V 100W halogen bulb[4]
Power transformer—Built into the base and adjustable from 0 to 12 volts[4]
Photomicrographic camera system—PM-10AD universal, fully modular multiformat camera system with automatic controls[4]

Plan your fab

Building a Metrology & Inspection process? Get a complete equipment list.

Open the fab equipment planner →
Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]alanwood.netalanwood.net
  3. [3]microscopeinternational.commicroscopeinternational.com
  4. [4]alanwood.netalanwood.net