Laurell

EDC-650-8B alternatives

Comparable Resist Processing equipment documented in the Waferpedia catalog.

6 comparable tools

Laurell
EDC-650-8 B
200mm
Resist Processing
The Laurell EDC-650-8 B is an EDC System 650-series spin coater with a maximum substrate size of ø 200mm (7" × 7") and a maximum speed of 12000 rpm.
Laurell
EDC-HL-8 B
200mm
Resist Processing
Laurell EDC-HL-8 B is an EDC System 650-series spin coater with a maximum substrate size of 200mm (7" x 7").
Laurell
H6-8 B
200mm
Resist Processing
The Laurell H6-8 B is a spin coater in the 650-series with a maximum substrate size of 200mm (7" x 7"), a maximum speed of 12000 rpm, and tabletop, in-deck, or on-deck mounting options.
Laurell
WS-650-8 B
200mm
Resist Processing
The Laurell WS-650-8 B is a 650-series spin coater with a maximum substrate size of 200mm (7" x 7") and a maximum speed of 12000 rpm.
Laurell
WS-650-8B
200mm
Resist Processing
The Laurell WS-650-8B is a spin coater in the 650 Series with a maximum substrate size of ø200mm (7" x 7") and a maximum speed of 12,000 rpm.
Headway
1 EC 101 R 485 Photoresist Spinner
Resist Processing
Headway 1 EC 101 R 485 is a photoresist spinner with stated vacuum and electrical requirements.

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