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Comparison ledger

WS-650-15 BversusWS-650-15B

Laurell WS-650-15 B, Laurell WS-650-15B, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
WS-650-15BLaurell
OEMLaurellLaurell
CategoryResist ProcessingResist Processing
Wafer size300mm300mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLaurell WS-650-15 BLaurell WS-650-15B
Specifications
TypeSpin Coater[1]—
Controller650-series[1]—
Max Substrate Sizeø 300mm (9" × 9")[1]—
Max RPM12000 rpm[1]12,000 rpm[3]
Mounting OptionsTabletop, In-Deck, On-Deck[1]—
OEMLaurell[2]—
ModelWS-650-15 B[2]—
Series650-series[2]650 Series[3]
Max substrate sizeø 300mm wafers and 9" × 9" (229mm × 229mm) substrates[2]300mm (9" x 9")[3]
CategorySpin Coater[1]—
Processes supportedCoating, Etching, Developing, Rinsing-Drying and Cleaning[2]—
Model type—spin coater[3]
Mounting options—Tabletop, In-Deck, On-Deck[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]images.laurell.comimages.laurell.com
  2. [2]laurell.comlaurell.com
  3. [3]laurell.comlaurell.com