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Comparison ledger

1505 G 6 EversusNNSR S 204 B

Nikon 1505 G 6 E, Nikon NNSR S 204 B, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
OEMNikonNikon
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run1988–—
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyNikon 1505Nikon NNSR S 204 B
Specifications
Configuration5" reticle[1]KrF[4]
Resolution650 nm[2]—
Numerical Aperture0.54[2]—
Reduction5x[2]—
Exposure Field15 x 15 mm[2]—
Alignment Accuracy130 nm[2]—
Wafer Size4 inch[1]—
Light Sourceg-line[3]—
Introduction Year1988[2]—
NA (Numerical Aperture)0.54[2]—
MakeNikon[1]—
Model1505 G 6 E[1]NNSR S 204 B[5]
CategoryStepper[1]Lithography[4]
Wafer Sizes4 inch[1]—
Exposure typeg-line[2]—
NA0.54[2]—
Exposure field9.3 x 18.8 mm[2]—
Manufacturer—Nikon[5]
Equipment type—Scanner[4]
Wafer sizes—8 inch[5]
Vintage—2000[5]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]web.archive.orgweb.archive.org
  3. [3]ece.utoronto.caece.utoronto.ca
  4. [4]waferpedia.comwaferpedia.com
  5. [5]Equipment inventory listing