Comparison ledger
Nikon 1505 G 6 E, OAI Model 800E, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1505 G 6 ENikon | Model 800EOAI |
|---|---|---|
| OEM | Nikon | OAI |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | 1988– | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon 1505 | OAI Model 800E |
| Specifications | ||
| Configuration | 5" reticle[1] | — |
| Resolution | 650 nm[2] | Sub-micron capability with optimized resist and process[8] |
| Numerical Aperture | 0.54[2] | — |
| Reduction | 5x[2] | — |
| Exposure Field | 15 x 15 mm[2] | — |
| Alignment Accuracy | 130 nm[2] | — |
| Wafer Size | 4 inch[1] | — |
| Light Source | g-line[3] | — |
| Introduction Year | 1988[2] | — |
| NA (Numerical Aperture) | 0.54[2] | — |
| Make | Nikon[1] | — |
| Model | 1505 G 6 E[1] | — |
| Category | Stepper[1] | — |
| Wafer Sizes | 4 inch[1] | — |
| Exposure type | g-line[2] | — |
| NA | 0.54[2] | — |
| Exposure field | 9.3 x 18.8 mm[2] | — |
| Product category | — | Mask aligner[4] |
| Operation mode | — | Semi-automatic[5] |
| Exposure sides | — | Frontside and backside[5] |
| Feature level | — | Advanced features and specifications found most often in costly automated production mask aligners[5] |
| System type | — | Front & backside semi-automatic mask aligner[6] |
| Platform | — | Built on OAI's modular platform[6] |
| Control system | — | Windows 10 control and recipe storage[7] |
| Alignment stages | — | Joystick-controlled alignment and optics stages[6] |
| Exposure modes | — | Vacuum contact, hard contact, soft contact, proximity[7] |
| Substrate size | — | Up to 8" square[7] |
| Mask size | — | Up to 9" x 9"[7] |
| Alignment cameras | — | Dual 1 MP GIGE CCD cameras; 4 total in backside configuration[7] |
| Wedge correction | — | Non-contact 3-point wedge effect correction / auto wedge effect compensation[7] |
| Optics | — | OAI Advanced Beam Optics[6] |
| UV source | — | High-intensity broadband Hg/Hg-Xe arc lamp (320-450 nm)[8] |
| Beam uniformity | — | Exceptional uniformity[6] |
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