Comparison ledger
Nikon LV100ND and Nikon Optistation 3100 Wafer, side by side. Every value shown is drawn from its cited encyclopedia entry.
| Attribute | LV100NDNikon | |
|---|---|---|
| OEM | Nikon | Nikon |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon LV100ND | Nikon Optistation |
| Specifications | ||
| Microscope type | Optical microscope[1] | — |
| Lighting | Top and bottom lighting using LED white light with adjustable intensity[1] | — |
| Objectives | 5X, 10X, 20X, 50X, and 100X Plan Fluor high numerical aperture lenses[1] | — |
| Brightfield / darkfield | 10X Ultra Wide Field brightfield and darkfield for all five lenses[1] | — |
| DIC | Selectable Nomarski Differential Interference Contrast for top-down lighting only[1] | — |
| Stage | 6" x 4" XY stage with glass plate[1] | — |
| Condenser | Abbe condenser[1] | — |
| Camera | DS-Ri2 Nikon camera, high definition 18 megapixel[1] | — |
| Software | Nikon NIS-Elements D Software[1] | — |
| Instrument count and locations | Two microscopes in the Flexible Cleanroom and two in the Nanopatterning Cleanroom[1] | — |
| Phase | — | 1 Phase[2] |
| Voltage | — | 200V[2] |
| Configuration | — | 50/60Hz[2] |
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