Comparison ledger
Nikon NSR 1755 i 8 A i-Line, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | |
|---|---|---|
| OEM | Nikon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon NSR 1755 | SUSS MicroTec 150 e Mask |
| Cited variants | — | |
| Specifications | ||
| Configuration | 0.45um[3] | — |
| Manufacturer | Nikon[3] | — |
| Model | NSR 1755 i 8 A[3] | — |
| Equipment type | i-Line Stepper[3] | — |
| Wafer sizes | 6, 8 inch[3] | — |
| Resolution | 0.45um[3] | — |
| Vintage | 1994[3] | — |
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