Comparison ledger
Nikon S 308 F, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | S 308 FNikon | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Nikon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon S 308 F | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | HDD included[1] | — |
| Light source | ArF (193 nm)[2] | — |
| Numerical aperture | 0.92[2] | — |
| Exposure area | 26 x 33 mm[2] | — |
| Reduction ratio | 1:4[2] | — |
| Resolution | <65 nm[2] | — |
| Throughput (300 mm) | >145 wph[2] | — |
| Throughput (200 mm) | >165 wph[2] | — |
| Wafer size | 200/300 mm[2] | — |
| Overlay accuracy | 8 nm[2] | — |
| Polarization control | POLANO[2] | — |
| Wafer size (alternative) | 12 inch[1] | — |
| Wavelength | 193 nm[2] | — |
| Lens NA | 0.92[2] | — |
| Polarization Control | POLANO (optional)[2] | — |
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