Comparison ledger
Oxford Instruments Ion Beam, Oxford Instruments Ion Beam 300, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Ion BeamOxford Instruments | Ion Beam 300Oxford Instruments |
|---|---|---|
| OEM | Oxford Instruments | Oxford Instruments |
| Category | Deposition | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments Ion Beam | Oxford Instruments Ion Beam |
| Specifications | ||
| Configuration | DC Hot Wire Filament Ion-Guns[1] | has some PLC errors[2] |
| Ion source type | DC hot wire filament[1] | — |
| Substrate motion | Planetary system[1] | — |
| Thickness monitoring | Quartz crystal microbalance (QCM)[1] | — |
| Substrate handling | Planetary system[1] | — |
| Film thickness monitoring | QCM for layer thickness[1] | — |
| Thickness Monitoring | QCM (Quartz Crystal Microbalance)[1] | — |
| Category | — | Etch[3] |
| Wafer size | — | 4 inch[2] |
| Vintage | — | 2007[2] |
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