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03 RR 8120-001-001 Wafer ExchangerversusOpus 3 SLT

Rorze 03 RR 8120-001-001 Wafer Exchanger, Semics Opus 3 SLT, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Attribute
OEMRorzeSemics
CategoryTest & ProbeTest & Probe
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyRorze 03 RR 8120-001-001 Wafer ExchangerSemics Opus 3 SLT
Specifications
Wafer size8 inch[1]8 inches, 12 inches[3]
ManufacturerRorze[1]Semics Inc.[4]
Model03 RR 8120-001-001[1]Opus 3 SLT[5]
Equipment typeWafer Exchanger[1]—
Type—Automatic[3]
Accuracy—1.5 µm[3]
Chuck size—175 x 200 mm[3]
Operating temperature—-40 to 200 °C[3]
Probing force—230 kgf[3]
Overall dimensions—1485 x 1720 x 960 mm[3]
Test temperature range—-55 °C to 200 °C[4]
Test temperature accuracy—±1 °C[4]
Chuck load capacity—200 kg[4]
Wafer Sizes Supported—8 inches, 12 inches[4]
Test Temperature Range (Alternative)—-40 °C to 200 °C[3]
System Overall Accuracy—±1.5 µm[4]
System Overall Accuracy (Alternative)—1.5 µm[3]
Chuck Flatness—within 15 µm[4]
Die Size Range—0.2 mm to 100 mm[4]
Acceptable Wafer Bow—2 mm for 8-inch and 12-inch wafers[4]
MTBF—> 180 hours[4]
OCR Image Recognition and Auto Needle Alignment—Yes (upward-looking camera, fully automatic)[4]
GPIB Communication—Yes[4]
Mapping Format Compatibility—TSK, TEL, OPUS[4]
Cleaning Modes—CLEAN PAD (100 mm x 200 mm), CLEAN WAFER (8 & 12 inch)[4]
Remote Control—TeamViewer, VNC[4]
Operating Temperature—-40 to 200 Degree C[3]
Equipment Name—高低温全自动探针台-Opus 3 SLT[4]
Instrument Number—22007413[4]
Origin—Korea[4]
Temperature Range—-55℃~200℃[4]
Temperature Accuracy—±1℃[4]
System Accuracy—±1.5 um[4]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]semiconductor.directorysemiconductor.directory
  4. [4]antpedia.comantpedia.com
  5. [5]Equipment inventory listing